High-κ Dielectric (HfO2)/2D Semiconductor (HfSe2) Gate Stack for Low-Power Steep-Switching Computing Devices |
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| Year of publication | 2024 |
| Title of paper | High-κ Dielectric (HfO2)/2D Semiconductor (HfSe2) Gate Stack for Low-Power Steep-Switching Computing Devices |
| Author | Taeho Kang, Joonho Park, Hanggyo Jung, Haeju Choi, Sang-Min Lee, Nayeong Lee, Ryong-Gyu Lee, Gahye Kim, Seung-Hwan Kim, Hyung-jun Kim, Cheol-Woong Yang, Jongwook Jeon*, Yong-Hoon Kim*, Sungjoo Lee* |
| Publication in journal | Advanced Materials |
| 게재권(호) | 36 |
| 페이지 | 2312747 |
| Link |
https://doi.org/10.1002/adma.202312747
724회 연결
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