"High‐κ dielectric (HfO2)/2D semiconductor (HfSe2) gate stack for low‐power steep‐switching computing devices"

Taeho Kang, Joonho Park, Hanggyo Jung, Haeju Choi, Sang‐Min Lee, Nayeong Lee, Ryong‐Gyu Lee, Gahye Kim, Seung‐Hwan Kim, Hyung‐jun Kim, Cheol‐Woong Yang, Jongwook Jeon, Yong‐Hoon Kim*, and Sungjoo Lee

Advanced Materials 36 (26), 2312747 (2024)