Atomic-Scale
Device Simulation Lab

Presentations

Mechanisms of HfSe2 layer-by-layer oxidation and clean van der Waals interface formation with 2D semiconductors: First-principles molecular dynamics simulation study
Year of publication 2025
Title of paper Mechanisms of HfSe2 layer-by-layer oxidation and clean van der Waals interface formation with 2D semiconductors: First-principles molecular dynamics simulation study
Author Joonho Park and Yong-Hoon Kim
Publication in journal Korean Physical Society
게재권(호) 10.22
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