High-κ dielectric (HfO2)/2D semiconductor (HfSe2) gate stack for low‐power steep‐switching computing devices

Taeho Kang, Joonho Park, Hanggyo Jung, Haeju Choi, Sang-Min Lee, Nayeong Lee, Ryong-Gyu Lee, Gahye Kim, Seung‐Hwan Kim, Hyung‐jun Kim, Cheol-Woong Yang, Jongwook Jeon, Yong-Hoon Kim*, and Sungjoo Lee*

Advanced Materials 36 (26), 2312747 (2024)